TFM-100

Manual thin-film thickness measurement system

A compact reflectance-based TFM system for thickness measurement on wafer, glass, polymer, and coating samples.

Manual inspectionRecipe workflow
TFM-100

Key Benefits

Core strengths for this TFM system.

01

Practical thickness coverage

Standard, NIR, and XT options support thin-film and transparent µm-range applications.

02

Easy recipe setup and reuse

Create a recipe from a simple sample-stack setup, save it, and reuse it for routine sample checks.

03

Accessible operation for non-specialist users

Designed so users can start practical thickness measurements without deep optical-modeling experience.

04

Compact manual platform for real samples

A compact manual-stage TFM system for wafer, glass, polymer, coating, and feasibility-test samples.

Specifications

Model options and common specifications.

ModelWavelength RangeThickness Range*Same-point Repeatability Reference
TFM-100 Standard350–1050 nm15 nm – 100 µm*500 nm SiO₂ reference sample, n=10
TFM-100 NIR750–1100 nm1 µm – 500 µm*850 / 1000 nm SiO₂ reference sample, n=10
TFM-100 XT1005–1080 nm100 µm – 2,000 µm*2000 nm SiO₂ or transparent reference film, n=10

* Depending on sample condition, film stack, substrate, optical contrast, and measurement recipe.

Measurement methodReflectance-based thin-film thickness measurement
Standard stage sample supportSupports wafers up to 4 inches.
Manual stage optionsOptional manual stage and fixture options support wafers up to 12 inches.
Larger samplesLarger sample sizes can be discussed.
Spot sizeApprox. 2–4 mm standard; smaller spots depend on the optical setup
Example repeatability checkExample SiO₂ Same-point Repeatability, n=10
SoftwareLite included
Light sourceTungsten-halogen standard; UV-VIS broadband source optional
Recommended installation spaceApprox. 1000 mm × 800 mm laboratory table
Power inputSingle-phase AC 100–240 V, 50/60 Hz (220 V standard)
Recommended available power200 W
Standard sampleThe reference sample is 500 nm SiO₂. Nominal 850 nm, 1000 nm, and 2000 nm options are available on request.
Example SiO2 same-point repeatability check table measured 10 times using a reference sample
EXAMPLE RESULT

Example SiO₂ Same-point Repeatability

A SiO₂ reference sample was measured 10 times at the same point as an example repeatability check.

Actual results may vary depending on film stack, substrate, optical contrast, sample condition, and measurement recipe.

Applications

Typical samples and coating structures for this TFM system.

Oxide films on Si waferSiO₂ Thickness MeasurementOxide thickness measurement for semiconductor, display, MEMS, and optical device applications.View →Nitride dielectric and passivation filmsSi₃N₄ Thickness MeasurementSilicon nitride film measurement for dielectric, hardmask, and passivation-related processes.View →PR coating on copper substratePhotoresist on Cu MeasurementPhotoresist thickness measurement on copper and PCB-related process substrates.View →PR coating on wafer substratePhotoresist on Wafer MeasurementPhotoresist and SU-8 thickness measurement on wafer, glass, and process substrates.View →

Accessories

Common accessories for this TFM measurement setup.

StageManual StageManual stage and fixture options support wafers up to 12 inches. Larger samples can be reviewed on request.
SourceUV-VIS Light SourceBroadband source option for UV-VIS reflectance setups.
StandardSiO₂ Reference SampleThe reference sample is 500 nm SiO₂. Nominal 850 nm, 1000 nm, and 2000 nm options are available on request.
ProbeReflectance ProbeStandard or long-range probe option, including 5 m and 10 m lengths.